Hafnium silicate (HfSiO4) is a chemical compound, a silicate of hafnium. Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.
Hafnium silicate (HfSiO4) is a chemical compound, a silicate of hafnium. Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.