Splinter pattern camouflage is a military camouflage pattern consisting of polygons. Splittermuster (German for splinter-pattern) was developed by Germany in the late 1920s. Splittermuster was issued to practically all Wehrmacht units. The pattern consists of a disruptive pattern of hard-edged polygons, with sharp corners between coloured patches. A random pattern of dashes was applied in places to improve the camouflage effect.