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Hafnium(IV) silicate
rdfs:comment
Hafnium silicate (HfSiO4) is a chemical compound, a silicate of hafnium. Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.
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Hafnium silicate (HfSiO4) is a chemical compound, a silicate of hafnium. Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.